?The machine is made of imported Roland collar plates, which can work in acid corrosive environments for a long time. It is sturdy and durable, with double layer leak proof.

?A process equipment that uses processes such as HF+HNO3/H3P04+HNO3 to clean the surface of silicon wafers for corrosion can clean 4 ", 5", and 6 "silicon wafers.

? Can be designed for manual and fully automatic operation. The fully automatic operation mode adopts two independent robotic arms, which can be lifted up and down.

? Cleaning capacity: 4-6 inch round plates, 25 pieces, 2 baskets/batch

? The temperature of each process tank is controllable and independently controlled.

? Modular design of each process tank, with corrosion tank and pure water flushing tank placed in a unified leak proof chassis. The corrosion groove is designed with bottom exhaust to reduce exhaust air volume.

?The process tank can be designed with lifting action for faster and more thorough cleaning.

?The control part adopts imported brands of PLC and HM;

?The front of the machine is equipped with one PTFE pure water gun and one PTFE nitrogen gun each placed on the right side.

?The equipment design standards are implemented in accordance with the semiconductor industry standard (SEMI-S2-93), and the ISO9001 quality management system is standardized and guaranteed.